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Wafer Fabs Available for Sale!!!

Note: All systems and fabs are subject to availability at time and date of inquiry.

Contents

• Novellus Sputter Deposition, Model 3290-STQ, 6 Inch
• Applied Materials Centura HP PVD, 6 Inch
• Sputtered Films, Inc. Model 8600, 6 Inch
• 8 Inch Kokusai Vertical Furnace
• Surplus Semiconductor Equipment
• Eaton Nova Ion Implanter, NV10-160, 4 Inch
• Eaton/Axcelis GSD-200, 8 Inch, High Current Ion Implant System
• Eaton NV8250P, 6 Inch, Medium Current Ion Implanter
• Varian Ion Implanter, 8 Inch, High Energy Ion Implantation System

Details and Configuration:

Quantity: 2
Excellent Condition
Serial No. LVE80511, Date Installed: June, 2000
Serial No. LVE80512, Date Installed: June, 2000

• Model 3290-STQ Fully automatic, cassette-to-cassette wafer loading and unloading:

• Quantum Sputter Deposition Sources for each Deposition Station including:
  • 1. (1) Quantum Sputtering Source
  • 2. (1) CMD GEN 2.5-12KW-DC power supply per source including:
    • a. Remote digital power supply readout meters
    • b. Conveniently installed in system control electronics rack
    • c. One set of 50 ft. cables for each Quantum Source

• 586 System Controller Including:
  • 1. 14" VGA colog touch screen via surface acoustic technology
  • 2. 238 Meg Hard Drive
  • 3. Interface Keyboard, Track Ball
  • 4. Printer Port
  • 5. Graphic User Interface
  • 6. Recipe Controlled Heaters
  • 7. Cryo Pump Quick Regeration Capability
  • 8. On-screen Data Collection and History Log
  • 9. User definable system access levels and access codes
  • 10. Diagnostic routines for maintenance and troubleshooting
  • 11. Programmable cool-time prior to wafer unload

• CTI Onboard Cryo Pump with Fast Regeneration capability
• Dedicated Load Lock Turbo Pump
• (2) Edwards ESDP 30 Mechanical Roughing Pumps
• Proximity Switches for Load Lock and Sealed Doors
• Particle Reduction Kit
• Electropolished Argon Develivery System
• Argon Line Isolation Valve
• AC Power Line Filter
• 15 Minute UPS
• (2) Sets of Quick Change Shields
• Quantum Targets
• RF Etch with Preheat at Station 1
• CTI Water Pump
• VIP at Station 1

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents

Details and Configuration:

Quantity: 1
Escellent Condition
Serial No. T-27094-33-2519, (System 2519)
Date Installed: May 2001

Applied Materials Cuntura HP PVD, 6", mainframe with:
• One ultra-high vacuum Centura HP PVD platform featuring the HP dual high speed wafer transfer robotics, dual load lock chambers, a Fast Regen Cryo pump, and wafer mapping cassette capability.

• The Centura HP PVD control system features a 32-bit microprocessor control, CRT display with light pen. Software capability includes sophisticated recipe programming, process parameter and wafer history storage, self diagnostics, automated service routines, and host computer interface via an RS232 port.

Chambers A, B, & D - Aluminum PVD (Aluminum Dura Source Process)
• PVD Chamber Opt.: Std. PVD Chamber
• PVD UHV Pump Opt.: CTI Fast Regen Low Vibration
• PVD Power Supply Opt.: High Accuracy Low Output (HALO)
• PVD Wafer Chuck Opt.: Mechanically Clamped Heaters
• Mechanical Clamped: Clamped "Original" Heater
• Clamp Ring Opt.: SST ARC Sprayed Clamp Rings
• Shield Opt.: SST One Piece Arc Sprayed
• PVD Pressure Control:
  • Gate Valve: 2-Position Gate Valve
  • Cryo Restrictors: Standard Cryo Restrictor

Chamber C - Aluminum PVD (Aluminum Dura Source Process)
• Same as above except:
  • Clamp Ring Opt.: Ti Arc Sprayed Clamp Ring

Chamber F - Auxiliary Chamber
• Orienter Chamber Opt.: Orienter with Std. Degas

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents

Details and Configuration:

Quantity: 2
Escellent Condition
Serial No. 19347
Date Installed: January, 1997

System No. 1:

• Software rev. 2.0
• Backing pumps for all modules are Vacuubrand MD-4l
• TM uses CTI 8510 Cryo compressor

• PM1 and PM3
  • Sputter module
  • Series 4.2 Gun
  • UPS
  • Omega CN3000 Controller
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE MDX-1.5K Magnetron Drive
  • AE MDX-1.5K Magnetron Drive
  • HP 6012B DC Power Supply
  • Pfeiffer TPH180HU Turbo

• PM2 and PM4
  • Sputter module
  • Series 4.2 Gun
  • UPS
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE MDX Pinnacle 6
  • AD MDX Pinnacle 6
  • HP 6012B DC Power Supply
  • Inficon Transpector RGA Head
  • Pfeiffer TPH180HU Turbo

• PM5
  • Degas, RF etch module
  • Series 3 Gun
  • UPS
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE MDX Pinnacle 6
  • HP 6012B DC Power Supply
  • Inficon Transpector RGA Head
  • Pfeiffer TPH180HU Turbo

• CM
  • Cassette module
  • Omega CN132 Controller
  • UPS
  • Pfeiffer TPH180HU Turbo

• TM
  • Transfer module
  • Inficon Transpector RGA Head
  • CTI-Cryogenics water pump
  • Pfeiffer TPH180HU Turbo

System No. 2:

• Software rev. 2.0
• Backing pumps for all modules are Vacuubrand MD-4l
• TM and PM3 share a CTI 9600 Cryo compressor

• PM1
  • Degas, RF etch module
  • Series 3 Gun
  • UPS
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE MDX Pinnacle 6
  • HP 6012B DC Power Supply
  • Pfeiffer TPH180HU Turbo

• PM2
  • Sputter module
  • Series 4.2 Gun
  • UPS
  • Omega CN3000 Controller
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE PE-10K AC Plasma Source
  • AE PE Power Pack
  • Pfeiffer TPH180HU Turbo

• PM3
  • Sputter module
  • Series 4 Gun
  • UPS
  • CTI Cryogenics Water Pump
  • Omega CN3000 Controller
  • AE RFX-600 RF Generator
  • AE ATX-600 RF Tuner
  • AE MDX-L12M
  • AE MDX-L12M
  • HP 6012B DC Power Supply
  • Inficon Transpector RGA Head
  • Pfeiffer TPH180HU Turbo

• PM4
  • Sputter module
  • Series 4.2 Gun
  • UPS
  • Omega CN3000 Controller
  • AE MDX Pinnacle 6
  • AD MDX Pinnacle 6
  • Pfeiffer TPH180HU Turbo

• PM5
  • Sputter module
  • Series 4.2 Gun
  • UPS
  • RGA Computer
  • AE MDX Pinnacle 6
  • AD MDX Pinnacle 6
  • Pfeiffer TPH180HU Turbo

• CM
  • Cassette module
  • Omega CN132 Controller
  • UPS
  • Pfeiffer TPH180HU Turbo

• TM
  • Transfer module
  • Inficon Transpector RGA Head
  • CTI-Cryogenics Water Pump
  • Pfeiffer TPH180HU Turbo

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents

If interested,   please click here.

Note: All Products: Subject to availability at time and date of inquiry.

Contents

Surplus or Excess Semiconductor Equipment

• 1 Ea - Dynatech Laboratories Immunoassay System with Microplate Reader, and Incubator Stacker

• Hitachi Model S-570 Scanning Electron Microscope

• Model Access 60 75 W CO2 /5 mW HeNe Laser

• Instrumentation Laboratories Model 661-10 Chemistry Analyzer

• Lumiscan Model 150 Lumiscan

• Perking-Elmer Model Lambda 31 UV/VIS Spectrophotometer

• Spectra-Physica Model 270 Laser Exciter
• Spectra-Physics Model SP4270 Integrator

• Tektronix Model 1480R WaveForm Monitor
• Tektronix Model 528 WaveForm Monitor
• Tektronix Model 1420 NTSC VectroScope

• UniLase Code # 2100 CO2 Laser

  If interested,   please click here.

  Note: All equipment are subject to availability at time and date of inquiry

  Contents

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  Eaton Nova Ion Implanter

  Item	Equipment/Description	Model/Vintage	Manufacturer	Comments
  1	High Current Ion Implanter	NV-10-160, 1993	EATON	Configured for 4 inch wafers. Very good working condition. Equiped with automatic loading system -AT-4. Purchased new in 1993, installed in 1994 by EATON's technical group.

  Please click on the stamp images below to see photos:

  

  If interested,   please click here.

  Note: All Products: Subject to availability at time and date of inquiry.

  Contents

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  Eaton/Axcelis GSD-200, Eight Inch
  High Current Ion Implant System
  S/N 080280

  Configuration

  • Configured for 200 mm wafers
  • Manufactured Date: May, 1996
  • CE Marked System
  • Interface:
    • Sun Spac V computer
    • MTI floppy and backup drive
    • Sun service monitor
    • Software version 4.4.2.1
    • SECS I/O interface
  • Programmable tilt angle: -10 to +10
  • Dose range: 1.0 E11 to 1.0 E17 ions/cm squared
  • Energy range: 10 to 180 keV
  • ASYST wafer handler
  • 4 cassette stages
  • Extra sources: Enhanced without vaporizer
  • Macrobot, s/n 95497
  • Oil-filled transformer

  • Auxiliary equipment:
    • Chiller: Neslab, s/n C95128144
    • Pumps:
      • Ebara 40x20 tur backup, s/n 956274
      • Ebara 40x20 end station pump, s/n 156270
      • Seiko H2000C turbo, s/n 0274R
      • CTI CT8 beamline, s/n 32C8916481
      • CTI CT10 end station, s/n 1389406376
    • Cryo compressors:
      • CTI 8300, s/n 85C0006349
      • CTI 8500, s/n 68B9608751

  If interested,  l please click here.

  Note: Subject to availability at time and date of inquiry.

  Contents

  ---

  Eaton NV8250P, 6 Inch
  Medium Current Ion Implanter

  Vital Information and Configuration:

  • Purchased 10/25/1998
  • Configured for 6 inch wafers
  • Sun Sparc 5 Operating System
  • Software version 3.5.2i
  • 8 mm tape backup
  • Extended life source (VLS)
  • Remote monitor
  • Miscellaneous parts of $100,000 spare parts kit remaining
    • 2 extra sources, approx $40,000 each
  • Seiko-Seiki turbos:
    • 2 with STP 100C controller
    • 1 STP 300C
  • Up to 750 keV with triple charge
  • 4x SDS gas box (subatmospheric delivery system)
  • Edwards DP40 W/ 350 blower for end station/load lock
  • 3 CTA on-board cryos
  • 2 Edwards DP40's for chamber
  • Neslab chiller
  • ESC chuck
  • Power conditioning/isolation transformer

  • Front End:
    • 3 load cassettes
    • Flat finder
    • Buffer cassette
    • Macrobot robot (standard)
    • Programmable flat orient (27.5 deg default)
    • Wafer rotation
    • Programmable auto tilt, 0 to 89 degrees

  If interested,   please click here.

  Note: All Products: Subject to availability at time and date of inquiry.

  Contents

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  Varian Ion Implanter, 8 Inch
  High Energy Ion Implantation System
  Model: G1510

  Configuration

  • Year of Installation: 1996
  • 200MM Batch
  • 9 Site Disk
  • 180 Wafers per Hour
  • 40 Kev to 3 Mev Energy Range
  • EBARA 40X20 Backing Pumps
  • Seiko-Seiki STP-H2000C and Varian XXX Turbo Pumps
  • CTI Cryo pumps
  • Up to 35 Degree Implant Angle
  • Touch Screen User Interface
  • (1) Triple Charge Implant
  • 1 Million Volts

  If interested,   please click here.

  Note: All Products: Subject to availability at time and date of inquiry.

  Contents

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  Please contact us at:

  OLM Enterprises
  Tel: (408)259-1900 Fax: (408)259-1990
  Toll Free Tel/Fax: 1-888-925-8293

  

  E-mail: webmaster@semiconweb.com

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  C1: Semiconductor Equipment Support List | C2: Semiconductor Equipment List | C2A: Semiconductor Equipment List | C2B: Semiconductor Equipment List | C2C: Semiconductor Equipment List | Vacuum Pump List | C3: More Vacuum Pumps | C5B: New Vacuum Pumps | C4: High Vacuum Systems | C5A: Rebuilt He Leak Detectors | C6A: More Semiconductor Equipment | Furnaces & Film Measurement | C6C: Implanters, Sputterers, Steppers, Etc. | C6D: Wafer Track, Inspection, Transfer Systems, & More | C7A: Rebuilt Plasma Systems | C7B: Vacuum Systems, Pumps, Power Supplies | C8: Vacuum Packaging Equipment | C9: Semiconductor Equipment, Used, Surplus | C10: Special Vacuum System | C11: Hardly Used R&D Semiconductor Equipment | C12: Laser Printing, Marking, Semiconductor and High Tech Equipment | C13: Semiconductor Equipment for Eight Inch (8") Wafer Fab | C14: Semiconductor Back End Equipment | C15: Parts & Semiconductor Back End Equipment | C16: Ellipsometers, Particle Counter, Probe Station, Auto Scriber, Etc. | C17: Used 8" Semiconductor Equipment | C18: He Leak Detectors, Vac Pumps, Turbo Balancing System | C18a: Vac Pumps, Semiconductor Equipment, Measurement System | C19: Helium Leak Detectors, RF Generator, Turbo Balancer | C20: Wafer Fab Equipment, Novellus Parts, Etc. | C21: Leybold Converters and Turbo Pumps | C22: Rebuilt Helium Leak Detectors & Vacuum Pumps | C23: 6" Semiconductor Equipment, MSGrp, Back End, Etc | C24: Wafer Saw, Handlers, Probers, Parts, 6" Wafer Fab Equipment, MSGrp, Etc | C25: Pre-owned, Used or Surplus HYGT Semiconductor Equipment and Back End Equipment , Etc. | C26: Four Inch (4") Used, Surplus, Rebuilt, or Pre-owned Semiconductor or Wafer Fab Equipment, Etc. | C26A: Four Inch (4") Used, Surplus, Rebuilt, or Pre-owned Semiconductor or Wafer Fab Equipment, Etc. | C26B: Four Inch (4") Used, Surplus, Rebuilt, or Pre-owned Semiconductor or Wafer Fab Equipment, Etc. | C27: Six Inch (6") Semiconductor or Wafer Fab Equipment Package, Etc. | C28: Surplus Semiconductor Equipment: Ion Implanters, Kokusai & TEL Furnaces, Resistivity Meter, Parts, Etc. | C29: Surplus, Used, Rebuilt Semiconductor Equipment: Ion Implanters, Furnaces, Testers, Parts, Etc. | C30: Semiconductor Equipment: Ion Implanter, Furnaces, Wafer Steppers, Parts, Etc. | C31: Used and Refurbished Semiconductor Equipment: Ion Implanter, Furnaces, Resistivity Meter, Parts, Etc. | Equipment Images & Photos | Mass Flow Controller List, GR-1 | Mass Flow Controller List, GR-2 | Mass Flow Controller List, GR-3 | MFC Related Equipment List | Applied Materials Parts List | Ion Implanter Parts & Services | Precision Fluid Pumps | Equipment List | Lam Systems Parts List | R&D Semiconductor Equipment & Tegal Parts List | Varian Parts List | Microscope & Accessory List | New Parts List | Related Equipment List | Test Systems & More Semi Equipment | Online Resources | Online Affiliates | Want List | Want List, G-2 | Want List, G-3 | Hot List Sale | Health Concerns | Advertise Worldwide Online
  

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