Semiconductor Equipment: Vacuum and Plasma Systems, Service and Parts
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We completely rebuild systems, and offer them with a 90 day warranty. We also do special modifications on these systems. We can configure many of these systems to your specifications. A complete source inspection at our facility is possible. Please see the following lists of our current inventory.
Equipment Purchasing/Trade
We will also buy your equipment, and take your systems in trade.
Equipment Spare Parts
We carry many spare parts for the systems listed below, specifically Branson/IPC, Drytek, Gasonics, LFE, Technics, Tegal, etc. Also, we have vacuum related products and fluids, and RF Power Tubes.
Equipment Repair/Service
We will completely rebuild your system at our facility, or service your system at your location. Our service rate plus travel expenses.
Plasma Processing
We have equipment installed at our facility to do surface treating and cleaning of your parts. This service can usually be performed within 24 hours.
Note:
All items included in the following table and list are subject to prior sale or availability upon time and date of inquiry.
Plasma Systems, Rebuilt
Item
Qty
Description
Condition
1
3 Ea
Applied Materials Model 3300 PECVD system, Silicon Nitride and Silicon Dioxide films, Wafer capacity: 42 ea 3" wafers, 22 ea 4" wafers, 16 ea 5" wafers, ENI Model PS-300 RF Power Supply, 2000W @ 8111 KHz, 3 zone temperature control, Gas shower, Vacuum pumps, and filtration system.
Rebuilt
2
1 Ea
Branson Model L2101 Plasma /Asher/Etcher, 1 ea 12" x 20" quartz chamber, low particulate, 5 ea mass flow gas inputs, computer controlled w/ recipe storage of up to 350 process steps, temp controller, Model PM 332/ENI OEM 12 1000W solid state RF Generator.
Rebuilt
3
1 Ea
Branson Model L2200 Plasma Stripper, 2 ea composite ceramic/aluminum chambers for 4-8" wafers, low particulate, cassette to cassette operation, computer controlled, robot/indexer loader/unloader, ENI 1000W solid state RF Generator.
Rebuilt
4
1 Ea
Branson Model L3200 Plasma Stripper, 2 ea quartz chambers for 3-6" wafers, low particulate, cassette to cassette operation, computer controlled, robot/indexer loader/unloader, ENI 1000W solid state RF Generator.
Rebuilt
5
2 Ea
Branson/IPC Model S2100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 3 ea gas inputs, with Model 2000C 3 channel process programmer, with temperature controller, Model PM112 1000W RF Generator.
Rebuilt
6
2 Ea
Branson/IPC Model S3100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 1 ea gas input, with Model 4000C 1 channel process programmer, Model PM112 1000W RF Generator.
Rebuilt
7
2 Ea
Branson/IPC Model S4100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 2 ea gas inputs, with Model 4000C 1 channel process programmer, Model PM112 1000W RF Generator.
Rebuilt
8
2 Ea
Branson/IPC Model S4150, 1 ea 16" (dia) x 30"(Depth) aluminum barrel, 10.5" dia x 24" depth faraday cage, 2 ea gas inputs, single channel process programmer, Model PM112 1000W RF Generator.
Rebuilt
9
2 Ea
Branson/IPC Model S7150, 1 ea 24" (dia) x 36"(Depth) aluminum chamber, 4 ea gas inputs, 3 channel controller, Model PM132 1500W RF Generator.
Rebuilt
10
2 Ea
Branson/IPC Model 2000, 1 ea 10" (dia) x 20"(Depth) quartz barrel, 3 ea gas inputs, with Model 921C 3 channel process programmer, with Model 921C temperature controller, Model PM119 500W RF Generator.
Rebuilt
11
2 Ea
Branson/IPC Model 4000, 2 ea 10" (dia) x 20"(Depth) quartz barrel, 2 ea gas inputs, with Model 9906U-4 single channel process programmer, Model PM112 1000W RF Generator.
Rebuilt
12
2 Ea
Branson/IPC Model 3000, 1 ea 8" (dia) x 13"(Depth) quartz chamber, 1 ea gas input single channel, Model PM119 500W RF Generator @ 13.56 MHz.
Rebuilt
13
1 Ea
Branson/IPC Model 4055 Plasma Surface Treatment/Cleaning syste, 5 ea 7" dia. X 17" depth aluminum trays, 2 ea gas inputs, single channel, Model PM 119 RF Generator, 500W @ 13.56MHz.
Rebuilt
14
1 Ea
Branson/IPC Model 4000, 1 ea 10" (dia) x 20"(Depth) quartz chamber, 2 ea gas inputs, single channel, Model PM119 500W @ 13.56MHz RF Generator.
Rebuilt
15
2 Ea
D&W Model 425 plasma etcher, 28" dia electrode for 2-5" wafers or flat panels, 3 ea mass flow gas inputs, 3 ea regulator controlled gas inputs, 4 channel digital controller, 3000W RF Generator @ 13.56MHz.
Rebuilt
16
3 Ea
Drytek Megastrip VI, for 5-6" wafers, batch type stripper, 2 gas inputs, single channel, Advanced Energy Model PE 1650 (Rev C) RF Generator, 1400W @ 25-100KHz
Rebuilt
17
1 Ea
Electrotech Model STS310/15 Plasma Nitride Deposition tool, 30 cm dia table, 8 ea gas inputs, PC controlled, self diagnostics, RF PP RFX600 RF Generator
Rebuilt
18
1 Ea
Gasonics/IPC Model 9104 Plasma Asher/Etcher, 1 ea 12 x 20" quartz chamber, low particulate, 4 ea mass flow gas inputs, computer controlled w/ 486 PC, temp controller, ENI Model OEM 12AB 1000W solid state RF Generator
Rebuilt
19
1 Ea
Leybold Model Z410S RIE/PE etcher, load-lock, pallet capable of handling up to 200mm wafer, can select power to bottom, top, or both electrodes, turbo pumped, MKS throttle valve, Xinix End Point Detector, 4 ea mass flow gas inputs, PLC/computer controlled, w/ ENI OEM6 RF Generator,
Rebuilt
20
3 Ea
LFE Model PFS/PcrE/PDS-501, 1 ea 10" (dia) x 18" (depth) quartz chamber, 3 ea gas inputs, 3 channels
Rebuilt
21
1 Ea
LFE Model PALE-301, for 3-4" wafers, single wafer parallel plate aluminum etcher, 2 ea gas inputs, 2 channels, 300W RF Generator
Rebuilt
22
1 Ea
LFE Model PALE-301, 1 ea 5" dia x 6" depth quartz chamber, 1 ea gas input, single channel, auto logic, auto tuning, 300W RF Generator
Rebuilt
23
1 Ea
Plasma Etch Model PE-1000 plasma surface treatment system, 23.75"W x 54.25L x 11"H aluminum chamber, automated system with conveyor, 1000W RF generator @ 13.56MHz, 2 ea mass flow controllers, PC computer controlled.
Rebuilt
24
1 Ea
Plasma Therm Model # System, VII 72, S/N PTI-4330M(05), 7/90, 11" dia electrode, configured for RIE, single chamber, Plasma Therm Model MSC-70 programmable controller/sequencer, RFPP Model RF5S RF Generator, 500W @ 13.56MHz w/ RFPP Model AM-5 matching network, w/ controller, MKS Model 252 Exhaust valve controller, w/ Throttle Valve, 6 ea Brooks mass flow controllers currently installed (can accept up to 8 MFC's), Tek Temp Model TKD-100 chiller (4000 BTU/hr), Power Distribution Assy, 208/240VAC, 3 Ph/60Hz/60A, Alcatel Model 2033C/RSV 300 pump/blower package.
Rebuilt
25
1 Ea
Technics Plasma RIB Etch 160-ECR LL Powercool, R&D Ion Beam Etcher w/ load lock, filament free ECR ion source, PC controlled, IBE, RIBE, and CAIBE modes of operation for etching III/V semiconductor compounds, silicon compounds, metals, and dielectrics, currently operational and can be demonstrated. New cost $800K +.
Rebuilt
26
1 Ea
Technics Model PE-IIA plasma etcher, 11" parallel plate, w/ deposition option, for 2-4" wafers, 2 ea gas inputs, 500W RF Generator @ 30 KHz, auto/manual logic,
Rebuilt
27
1 Ea
Tegal Model 965 Plasma Asher/Stripper system for up to 6" wafers, batch type, 1 ea gas input, 9 ea process recipe storage, auto logic, auto tuning, 500W RFPP solid state RF Generator
Rebuilt
28
1 Ea
Tegal Model 803 Plasma Oxide Etcher, for 4" wafers, single wafer cassette to cassette, 4 ea gas inputs, two channels, ENI 1 KW RF Generator, auto logic/tuning.
Rebuilt
29
2 Ea
Tegal Model 701 Plasma Poly Etcher, for 4" wafers, single wafer cassette to cassette, 4 ea gas inputs, two channels, 300W RF Generator, auto logic/tuning.
Rebuilt
30
2 Ea
Tegal Model 421, for 2-4" wafers, batch type stripper/nitride etcher, 2 ea gas inputs, two channel, Preheating capability, manual tuning, auto/manual logic, 300W RF Generator.
Rebuilt
31
2 Ea
Tegal Model 415, for 2-4" wafers, batch type stripper, 1 ea gas input, single channel, auto tuning, auto/manual logic, 300W RF Generator.
Rebuilt
32
3 Ea
Tegal Model 411, for 2-4" wafers, batch type stripper, single gas input, single channel, 300W RF Generator, manual matching network.
Rebuilt
33
3 Ea
Tegal Model 211, for 2-3" wafers, batch type stripper, 1 ea gas input, single channel, 300W RF Generator.
Rebuilt
R&D Semiconductor Equipment For Sale
Note: The following equipment were purchased new are slightly used for R&D application only. The number of substrates processed is very minimal, so, all equipment are in very good condition. Ages are more or less 5 years old.
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