Pre-owned, Surplus, Used, Rebuilt or Refurbished Mass Flow Controllers, Flowmeters, & Semiconductor Equipment, Gr-3

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Wafer Fabs Available for Sale!!!

5 Inch Wafer Fab Line Available!!!
Capacity: 15 thousand wafers/mo, .8 um, CMOS
Please click here.

5 Inch Wafer Fab Equipment Available!!!
Please click here for list.

6 Inch Wafer Fab Line Available!!!
Capacity: 20 thousand wafers/mo, .5 um, CMOS
Please click here.

Note: All systems and fabs are subject to availability at time and date of inquiry.

Please feel free to search for the product you came for. Products in this site are Indexed by the FreeFind Search Engine.

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Brooks Instruments
Models 5850E and 5850EM

Item	Gas	Flow	Qty	Comments
1	H2	1 Slm	2	New, Boxed
2	H2	1 Slm	1	Rebuilt
3	SiH4	50 Sccm	2	Rebuilt
4	SiH4	200 Sccm	1	Rebuilt
5	O2	300 Sccm	1	Rebuilt
6	N2	1 Slm	2	Rebuilt
7	PH3	100 Sccm	1	Rebuilt
8	PH3	500 Sccm	2	Rebuilt
9	HBR	300 Sccm	1	Rebuilt
10	HCL	300 Sccm	1	Rebuilt
11	NH3	300 Sccm	1	Rebuilt
12	NH3	500 Sccm	2	Rebuilt
13	TMB	15 Sccm	1	Rebuilt
14	ARGON	20 Slm	1	Rebuilt
15	O2	10 Slm	1	Rebuilt

Item Gas Flow Qty Comments

1 TMB 15 Sccm 1 Clean

2 SiCL4 30 Sccm 4 Clean

3 SF6 50 Sccm 1 Clean

4 SiH4 50 Sccm 2 Clean

5 SiH2CL2 50 Sccm 2 Clean

6 75%SiH4/PH3 50 Sccm 1 Clean

7 PH3 100 Sccm 1 Clean

8 HCL 100 Sccm 4 Clean

9 75%SiH4/PH3 100 Sccm 2 Clean

10 SiH4 100 Sccm 3 Clean

11 SiH2CL2 100 Sccm 1 Clean

12 SiH4 200 Sccm 2 Clean

13 NH3 300 Sccm 3 Clean

14 O2 300 Sccm 2 Clean

15 CHF3 300 Sccm 1 Clean

16 SiH4 400 Sccm 4 Clean

17 NH3 500 Sccm 1 Clean

18 N2 1 Slm 5 Clean

19 N2 2 Slm 2 Clean

20 O2 2 Slm 3 Clean

21 NH3 500 Sccm 2 5850EM, Clean

22 BCL3 50 Sccm 3 5850EM, Clean

Click here for MFC related equipment.

Please feel free to contact us for any possible typographical error or unclear abbreviations.

If interested in one or more items, please click here.

If you need Vacuum Pumps, please click here.

New Parts for Novellus Systems

Item #	OEM P/N	Description	Quantity
1	02-0093-00	One Arm Robot	4
2	15-00701-00	Bottom Fork Plate, 150 MM	10
3	15-00703-00	Top Fork Plate, 150 MM	10
4	16-033932-00	Pinned Showerhead Weldment, 150 MM	16
5	16-033931-00	Pinned Showerhead Weldment, 200 MM	16
6	02-029514-01	Left Indexer Assembly	1
7	02-029514-02	Right Indexer Assembly	1

If interested in one or more items, please click here.

Semiconductor or Wafer Fab Equipment for Five Inch Wafers

Note 1: Original configuration is for 5 inch wafer. Some are convertible to 6 inches/other sizes.

Note 2: All equipment are store in clean/humidity-temperature controlled room.

Item #	Ref #	Equipment Name	Manufacturer	Model	Size	Original Acquisition Date
1	S01	G-Line Stepper	Nikon	NSR1505G3A		8803
2	S02	G-Line Stepper	Nikon	NSR1505G3A		8808
3	S03	G-Line Stepper	Nikon	NSR1505G4BK		9303
4	S04	G-Line Stepper	Nikon	NSR1505G4D		8802
5	S05	G-Line Stepper	Nikon	NSR1505G4D		9509
6	S06	G-Line Stepper	Nikon	NSR1505G6E	5,6	9809
7	S07	G-Line Stepper	Nikon	NSR1505G6E	5,6	9109
8	S08	G-Line Stepper	Nikon	NSR1505G7E		9009
9	S09	I-B38Line Stepper	Nikon	NSR1505i7A	5,6	0103
10	S10	Resist Coater and Developer	DNS	SKW-636BVP	5,6	9903
11	S11	Deep UV Curing System	Ushio Electric	UMA-802-H6		8802
12	S12	Deep UV Curing System	Ushio Electric	UMA-802-HC57MS	5,6	9201
13	S13	Character Exposure System	Canon	AIM-630	5,6	8708
14	S14	Lamp Annealing System	DNS	LAW-6L3-A		8801
15	S15	Lamp Annealing System	DNS	LAW-815	5,3	9503
16	S16	Dry Etcher	Tokya Ohka	OAPM-301B		8603
17	S17	Dry Etcher	Tokya Ohka	TCE-2600		9104
18	S18	Dry Etcher	Tokya Ohka	OPM-A1250		8802
19	S19	Dry Etcher	Tokya Ohka	OPM-A1200		8409
20	S20	Dry Etcher	Tokya Ohka	OAPM-A1200		8703
21	S21	Dry Etcher	Alcantec	MAS-801	5,6	9610
22	S22	Dry Etcher	Alcantec	MAS801-HR		0102
23	S23	Dry Etcher (Polysilicon)	Hitachi	M216A-2	5,6	9703
24	S24	Dry Etcher (Polysilicon)	Tokyo Ohka	OAPM-406		9409
25	S25	Dry Etcher (Polysilicon)	Hitachi	M216A-2		9703
26	S26	Dry Etcher (Oxide)	TEL	TE-5000	5,6	9703
27	S27	Dry Etcher (Oxide)	TEL	TE-4000		9703
28	S28	Dry Etcher (Oxide)	TEL	TE-8400S		9703
29	S29	Dry Etcher (Oxide)	TEL	TE-8400PE		9701
30	S30	Dry Etcher (Oxide)	Tokyo Ohka	OAPM-301B		8509
31	S31	Dry Etcher (Oxide)	Anelva	ILD-4003		8509
32	S32	Dry Etcher (Oxide)	Anelva	ILD-4013T		9503
33	S33	Dry Etcher (Metal)	Hitachi	M308AT		9011
34	S34	Plasma Etcher	Tokyo Ohka	OPM-A1200		8503
35	S35	Wafer Scrubber	DNS	SSW-636		9104
36	S36	Wafer Scrubber	DNS	SSW-627		9003
37	S37	Wafer Scrubber	DNS	SSW-629-B		9501
38	S38	Wafer Scrubber	DNS	SSW-636-B	3,4,5,6	8902
39	S39	Implanter (Medium Current)	Nisshin Electric	NH-20S	5,6	9203
40	S40	Implanter (Medium Current)	Nisshin Electric	SPCV1850U116-FL		9508
41	S41	Implanter (High Current)	TEL/VARIAN	80/10		9502
42	S42	Implanter (High Current)	AMAT	PI9500		9506
43	S43	Implanter (High Current)	Nisshin Electric	NH-40SR		9309
44	S44	APCVD	AMJ	AMS-2100	5,6	8709
45	S45	APCVD	AMAYA	AEC-2260	5,6	9505
46	S46	PECVD	ASM	EECVD		8802
47	S47	Sputtering System, Aluminum	TEL/VARIAN	VARIAN-3180		9003
48	S48	Sputtering System, Aluminum	TEL/VARIAN	VARIAN-3180		9403
49	S49	Sputtering System, Aluminum	Tokuda MFG	CCS-1400		8909
50	S50	Diffusion Furnace, Horizontal	TEL	DL-8P-473-SDDC		9304
51	S51	Diffusion Furnace, Horizontal	TEL	DL-8P-473LT-SDDC		9503
52	S52	Mask Aligner	Canon	PLA-501FA		8709
53	S53	Coater Developer	DNS	SKW-636-BV	5,6	9309
54	S54	Coater Developer (Polyimide)	DNS	SCW-524-BVQ	3,4,5,6	8603
55	S55	Developer (Polyimide)	DNS	DVW-423A		8703
56	S56	Curing Oven	Oshitari	SCOX-1300-H		8603

Item #	Ref #	Equipment Name	Manufacturer	Model	Size	Original Acquisition Date
1	K69	Inspection Station	Canon	VIR-600	5,6	8703
2	K70	Wafer Particle Monitor System	Hitachi Deco	IS-1010		8909
3	K71	Wafer Particle Monitor System	Topcon	WM-3		8909
4	K72	Pattern Defect Review System	KLA-TENCOR	KLA2111		0103
5	K73	Pattern Defect Review System	KLA-TENCOR	KLA2131E		9610
6	K74	Overlay Measurement System	KLA-TENCOR	KLA5010		0109
7	K75	Al Film Thickness Measurement System	KLA-TENCOR	M-GAGE20		8509
8	K76	Al Film Thickness Measurement System	KLA-TENCOR	M-GAGE300		9201
9	K77	4 Point Probe	Kokusai Electric	VR-30A		8602
10	K78	Ellipsometer	Rudolph Research	2C.4C		8601
11	K79	Ellipsometer	Rudolph Research	AUTO.EL	4,5,6	8509
12	K80	Ellipsometer	Rudolph Research	SS1,4D		8703
13	K81	Film Thickness Measurement System	NANOMETRICS	NANOSPECT/AFT		9509
14	K82	Film Thickness Measurement System	NANOMETRICS	NANOSPECT/AFT		8603
15	K83	X-ray Analysis System	TECHNOS	TREX610		9309
16	K84	FTIR System	Nicolet Instruments	ECO-8S		8801
17	K85	CD SEM	Hitachi	S-6000	5,6	8808
18	K86	CD SEM	Hitachi	S-7000		9009
19	K87	CD SEM	Hitachi	S-7080		9303
20	K88	CD SEM	Hitachi	S-6200H		9506
21	K89	CD Measurement System	Nikon	LAMPAS-M3	3,4,5,6	8603
22	K90	CD Measurement System	Nikon	LAMPAS-HD	3,4,5,6	9203
23	K91	Inspection Station	Canon	VIR-600	5,6	8603
24	K92	Parametric Test System	Keithley	S350		8503
25	K93	Wafer Particle Monitor System	Hitachi	HILIS-200	4,5,6	8703

If interested in one or more items, please click here.

Measurement Instrument or System for Machine Diagnostics and Predictive Machine Maintenance

Schenck, Model VIBROTEST 41

Please click on the image below for enlarged photo

A good business can be established with this equipment. Contact us for details. Basically new. Never been used except for the first time demonstration by the Schenck's Engineer. A "must" for high speed balancing in a "Turbo Pump Repair" business and other applications.

The VIBROTEST 41 is a portable, battery operated, lightweight measuring instrument that can make the following measurements:

Overall

Bearing vibration
Rolling element bearing condition (BEARCON)
Shaft vibration (X/Y)
Temperature
Process parameter

Frequency Spectrum

Balancing

One (1) plane
Two (2) planes

Oscilloscope

Time trace

Strobe

If interested, please click here.

Rotary Polishing Wheel

Please click on the image below for enlarged photo

Mounted Felt Polishing Wheel

3M Satin Finishing Material
Stainless steel material for 3/32" shank and related parts
- Specifications:
  - 7/8 X 3/8 X 3/32
  - 7/8 X � X 3/32

Minimum volume required to order this product. Packed or unpacked. Packing may be specified by buyer.

R&D Semiconductor Equipment For Sale

Note: The following equipment were purchased new are slightly used for R&D application only. The number of substrates processed is very minimal, so, all equipment are in very good condition. Ages are more or less 5 years old.

Item	Equipment	Model	Notes	Voltage/Current	Dimensions
1	SK Vapor Dryer	51028	IPA Dryer	240V/70A	45W X 24D X 100H
2	AEP Stripper	UC-7550	Flat Panel Stripper	208V/200A	74W X 50D 94H
3	O3 Detector	IN 2000-3	Ozone Monitor	120V/1.5A	N/A
4	Steag Wet Etch	FPD-400	Wet Etch with Robot	208V/60A	71W X 51L X 65H
5	AKT RIE	1600-ETCH	2 Etch Chambers	208V/240A	Cluster Tool
6	AKT PVD	1600-PVD	2 Sputter Chambers	208V/320A	Cluster Tool
7	Steag Coater	FPD 400	Resist Coater/Developer	208V/175A	115W X 82D X 73H
8	Tamarack	T-300	Photo Lithography Tool	208V/15A	67W X 59D X 103H

If interested in one or more items, please click here.

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